Ran Xue
- Masterstudent
- Photoresist line edge Roughness and smoothing technique in EUV Lithography
- Supervision:
Prof. Dr.rer.nat. Uli Lemmer
Danilo De Simone, Prof. Stefan De Gendt´, IMEC, Leuven Belgien
Prof. Dr.rer.nat. Uli Lemmer
Danilo De Simone, Prof. Stefan De Gendt´, IMEC, Leuven Belgien