Plasma technology laboratory
Plasma sources for plasma torches for substance synthesis, UV ND lamps for water purification and sterilization, ink curing with UV, functional surfaces are used as tools in many processes today. For the monitoring of optical processes the necessary measurement and process technology is developed in the working group Light, EVG and Plasma Technologies. This includes, for example, the online monitoring of curing processes by IR sensor systems.
High and low pressure plasmas are also characterized with a wide range of light and radiation measurement techniques, spectroscopy, transmission and reflection measurements. The measurement of electrical parameters (pulse measurement technique) and imaging short-time measurements as well as thermography complete the measurement technique. In all measurements carried out on it, the highest value is placed on precision and reproducibility. In many cases there is the possibility to measure traceable to the PTB.