M.Sc. Jan Dycke
- Wissenschaftlicher Mitarbeiter
- Leistungselektronik
- Raum: 223
- Tel.: +49 721 608-48141
- jan dycke ∂does-not-exist.kit edu
- Engesserstrasse 13, Geb. 30.34
76131 Karlsruhe
Publikationen
2023
Characterization of Argon/Hydrogen Inductively Coupled Plasma for Carbon Removal over Multilayer Thin Films
Wang, Y.; Gehring, T.; Jin, Q.; Dycke, J.; Kling, R.
2023. Coatings, 13 (368), Article no: 368. doi:10.3390/coatings13020368
Wang, Y.; Gehring, T.; Jin, Q.; Dycke, J.; Kling, R.
2023. Coatings, 13 (368), Article no: 368. doi:10.3390/coatings13020368
2022
SiC-based Resonant Converters with ZVS Operated in MHz Range Driving Rapidly Variable Loads: Inductively Coupled Plasmas as a Case of Study
Eizaguirre Cabrera, S.; Gehring, T.; Denk, F.; Jin, Q.; Dycke, J.; Renschler, M.; Hiller, M.; Lemmer, U.; Kling, R.
2022. IEEE transactions on power electronics, 37 (7), 7775–7788. doi:10.1109/TPEL.2022.3147947
Eizaguirre Cabrera, S.; Gehring, T.; Denk, F.; Jin, Q.; Dycke, J.; Renschler, M.; Hiller, M.; Lemmer, U.; Kling, R.
2022. IEEE transactions on power electronics, 37 (7), 7775–7788. doi:10.1109/TPEL.2022.3147947
2021
On the Temperature and Plasma Distribution of an Inductively Driven Xe-I2-Discharge
Gehring, T.; Eizaguirre, S.; Jin, Q.; Dycke, J.; Renschler, M.; Kling, R.
2021. Plasma, 4 (4), 745–754. doi:10.3390/plasma4040037
Gehring, T.; Eizaguirre, S.; Jin, Q.; Dycke, J.; Renschler, M.; Kling, R.
2021. Plasma, 4 (4), 745–754. doi:10.3390/plasma4040037